Wafer Washers

Click to download the DG150WW Full Spec Sheet.

Click to download the DG200WW Full Spec Sheet.

Brand New With Warranty

Applications

  • Accommodates substrates mounted on film frames, tape rings or un-mounted
  • Film frames for round substrates up to 8” (200mm)
  • Square substrates up to 8” x 8” (200mm x 200mm)
  • Typical system applications:
    • Wafer cleaning after dicing
    • Photo-mask cleaning
    • Thin Film substrate cleaning
    • Wafer flux cleaning (flip chip)

Model DG150WW / DG200WW

Manually Loaded Automatic Cleaning System

Features

  • Microprocessor based process controller with LCD screen
  • Easy to navigate on screen menus
  • Digitally programmed wash and dry time parameters
  • Adjustable spin speed control
  • Wash spray pressure up to 2500 psi
  • Cylinder actuated sweep arm with adjustable speed and travel
  • N2 dry with IR heat lamp eliminates all residual water
  • Large IR heat lamp shield stays cool to the touch
  • Splash guard prevents contamination
  • Large opening for easy access to load and unload substrate
  • Interchangeable spin chucks - standard or custom designs
  • Chuck vacuum, N2 pressure, exhaust and cover safety interlocks
  • External house drain and exhaust
  • Small footprint - custom enclosures available

System Specifications

PROCESS CONTROL SYSTEM

Reciprocating Sweep Arm:

  • Wash spray and N2 dry are integrated into single arm
  • Interchangeable nozzles for different spray volume
  • Cylinder actuated sweeping movement
  • Adjustable sweep speed, travel start and stop locations

Washing System:

  • Adjustable spray pressure up to 2500 psi
  • Pressure release dump valve prevents nozzle drips

Drying System:

  • Adjustable N2 dry pressure
  • IR heat lamp 250 Watt

Spin motor:

  • Direct drive spindle with DC motor
  • Spin speed 100 to 3,600 rpm

Inter Changeable Chucks (Customer Specified):

  • Film frame chucks with alignment pins. Vacuum hold down of substrate and centrifugal pendulum clamps for frame
  • Un-mounted substrate chucks with vacuum hold down
  • O-ring chucks for photo masks

SOFTWARE

PLC Process Controller:

  • Time programmable wash and dry steps (2 Steps)
  • Timing Range 1 to 999 seconds (1 second increments)
  • Plain English on screen operation prompts and errors
  • Easy to navigate on screen menus for programming processes parameters

FACILITIES AND INSTALLATION SPECIFICATIONS

Facilities Requirement* Hookup
Power Requirements 15V AC - 60Hz - 6 Amp Max 3 prong D- type Receptacle  
Nitrogen 80 psi (5, 5 bar) minimum ¼” OD tube quick connect
Water  10 psi (0, 7 bar) minimum 1/8” Female NPT
Drain     ¾” Female NPT
Exhaust (If equipped) 100 cfm max, 0.5” H2O min 4” ID tube connection
Vacuum Internal venture generator  
Dimensions (L x W x H) 22.5”x18.5”x49” (47x57x125cm)  
Weight   132 lbs (60kg)  
Operating Temperature  32º - 104º F (0º - 40º C)  

*Requirements may vary depending on process

Don't see what you are looking for?
Give us a call @ 480-917-3640 or follow this link and we'll help you find it.